Tytemn Corporation

Tytemn Corporation (株式会社タイテム) is a small Japanese chemical company based in Yokohama, Kanagawa Prefecture, with its registered head office in Kamakura. Founded in April 1996 by Toshio Nozaki as a limited liability company (有限会社タイテム), it was reorganized into a joint-stock corporation (株式会社) in August 1999. The company positions itself as a pioneer of synthetic abrasive grains (合成砥粒のパイオニア) and has focused since its founding on the development and commercialization of polishing agents for silicon wafers and other electronic materials. Tytemn's core technology is colloidal silica, particularly a proprietary "cocoon-shaped" (繭型) colloidal silica and a newer generation of the same. These materials are used as precision polishing abrasives in semiconductor manufacturing. The company holds patents on its cocoon-shaped silica technology in Japan (granted April 2011) and South Korea (granted August 2012). In July 2010, Tytemn established a joint venture, AT Silica Corporation (ATシリカ株式会社), together with Air Water Inc. (エア・ウォーター株式会社). Under this arrangement, Tytemn contributed its technology and business know-how while Air Water provided capital and industrial scale. AT Silica took over the manufacturing and sales of silicon wafer polishing materials, and Tytemn has since shifted its own operational focus to acting as a shareholder supporting AT Silica's business. AT Silica is listed as Tytemn's main business partner. As of its latest corporate profile, Tytemn has capital of 10 million yen and only three employees, reflecting its role as a technology-holding and licensing entity rather than a large-scale manufacturer. Its representative director is Toshio Nozaki. The company moved its head office to its current Yokohama address in November 2013, and in January 2022 announced a further head office relocation. Tytemn remains a privately held, active company.

Tytemn Corporation was established in April 1996 as a limited liability company (有限会社タイテム) by Toshio Nozaki, with capital of 5 million yen and its registered head office at its current registered address in Kamakura. In August 1999, the company was reorganized into a joint-stock corporation (株式会社タイテム) and its capital was increased to 10 million yen. In August 2000, it opened its head office at 252 Yamashitacho, Naka-ku, Yokohama (Granbell Yokohama Building). From its founding, Tytemn concentrated on the development of polishing agents for silicon wafers and succeeded in developing a number of proprietary technologies, which it licensed to other companies and used as a basis for joint ventures. In January 2004, it filed a patent for its "new cocoon-shaped" colloidal silica; the patent was granted in Japan in April 2011 and in South Korea in August 2012. In July 2010, Tytemn formed a joint venture, AT Silica Corporation (ATシリカ株式会社), with Air Water Inc. (エア・ウォーター株式会社). Under the joint business plan, AT Silica began manufacturing and selling silicon wafer polishing materials using Tytemn's technology and business know-how. Following this, Tytemn shifted its own operational focus to acting as a shareholder of AT Silica and supporting its business operations. In November 2013, Tytemn moved its head office to its current address at 6-86-1 Onoecho, Naka-ku, Yokohama (Kannai Mark Building). In January 2022, the company announced another relocation of its head office. As of its latest corporate profile, Tytemn has capital of 10 million yen and three employees. Its main business partner is AT Silica Corporation, and its principal bank is Mitsubishi Tokyo UFJ Bank. The representative director is Toshio Nozaki.

• Founded as a limited liability company (有限会社タイテム) with capital of 5 million yen; registered head office established at current registered address.

• Reorganized into a joint-stock corporation (株式会社タイテム); capital increased to 10 million yen.

• Head office opened at 252 Yamashitacho, Naka-ku, Yokohama (Granbell Yokohama Building).

• Filed patent for new cocoon-shaped colloidal silica.

• Established joint venture AT Silica Corporation with Air Water Inc.

• Patent for new cocoon-shaped colloidal silica granted in Japan.

• Patent for new cocoon-shaped colloidal silica granted in South Korea.

• Head office relocated to current address at 6-86-1 Onoecho, Naka-ku, Yokohama (Kannai Mark Building).

• Announced relocation of head office.

Pioneer of synthetic abrasive grains; technology-holding and licensing company focused on colloidal silica for semiconductor polishing.

• Cocoon-shaped colloidal silica

  Proprietary colloidal silica used as a precision polishing abrasive for electronic materials, particularly silicon wafers.

• New cocoon-shaped colloidal silica

  Next-generation cocoon-shaped colloidal silica; patented in Japan (2011) and South Korea (2012).

1. 1株式会社タイテム 公式サイトtytemn.co.jp
2. 2沿革 | 会社概要 | 株式会社タイテムtytemn.co.jp
3. 3会社概要 | 株式会社タイテムtytemn.co.jp
4. 4ご挨拶 | 会社概要 | 株式会社タイテムtytemn.co.jp
5. 5Tytemn Corporation (Japan) - Wikidatawikidata.org