n&k Technology, Inc.

n&k Technology, Inc., of San Jose, California, was founded in 1992 by Drs. Rahim Forouhi and Iris Bloomer. The company manufactures high resolution scatterometry (OCD) and thin film metrology tools for the semiconductor, photomask, data storage, flat panel display and solar cell industries. Its optical metrology systems for Thin Film and Trench/OCD applications are described as field-proven for monitoring critical processing steps, and its analysis is based on the Forouhi-Bloomer dispersion equations.

n&k Technology, Inc., of San Jose, California, was founded in 1992 by Drs. Rahim Forouhi and Iris Bloomer. The company manufactures exceptionally high resolution, state-of-the-art scatterometry (OCD) and thin film metrology tools for the semiconductor, photomask, data storage, flat panel display and solar cell industries. Its tools provide measurements for a large range of OCD and thin film structures covering current and future applications.

Optical metrology systems described as field-proven and production-worthy, with analysis based on the Forouhi-Bloomer dispersion equations.

• Olympian Series

  Flagship high-throughput DUV-Vis-IR scatterometer/thin film metrology system with micro-spot technology, covering reflectance measurements from 190nm to 15,000nm.

• OptiPrime-X Series

  High-throughput DUV-Vis-NIR scatterometers/thin film metrology systems covering reflectance measurements from 190nm to 1000nm with micro-spot technology and a single wavelength ellipsometer at 633nm.

• OptiPrime Series

  High-throughput DUV-Vis-NIR scatterometers/thin film metrology systems covering reflectance measurements from 190nm to 1000nm with micro-spot technology.

• OptiPrime M Benchtop Metrology System

  Benchtop metrology system for thin film or Trench/OCD applications, incorporating reflectance-only or reflectance and transmittance.

• Gemini Series

  Automated metrology systems used to fully characterize and monitor thin film and OCD applications for current and next generation IC processes, capable of simultaneous reflectance and transmittance measurements.

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